Engineering Project
LPCVD Silicon Wafer Reactor Uniformity Modeling
Coupled fluid dynamics, heat/mass transfer simulation, and 2^k factorial Design of Experiments in COMSOL & MATLAB.
Context & Engineering Scope
Computational modeling and experimental design of a Low Pressure Chemical Vapor Deposition (LPCVD) boat reactor achieving nearly 100% silicon wafer deposition uniformity.
Achieving uniform silicon deposition across wafers inside an LPCVD boat reactor requires balancing coupled fluid dynamics, heat transfer, and mass transfer parameters.
Methodology & System Design
- 01. COMSOL Multiphysics Reactor Design: Built a boat reactor model in COMSOL combining fluid dynamics, heat transfer, and mass transfer physics.
- 02. 2^k Factorial Design of Experiments (DoE): Computed a 2^k factorial design to identify the most influential operating parameters.
- 03. 2D & 3D Wafer Uniformity Rendering: Rendered 2D and 3D wafer uniformity profiles in MATLAB to evaluate parameter sensitivity across the reactor.
Key Results
- Designed a boat reactor configuration achieving nearly 100% silicon wafer uniformity in COMSOL simulations.
- Quantified key process sensitivity parameters through 2^k Design of Experiments and 2D/3D MATLAB visualization.